To meet increased global demand for its E-Beam Lithography (EBL) production systems, Multibeam has opened a new sales office in Japan. President Ken MacWilliams announced the move in Yokohama during his keynote talk at Photomask Japan, the leading symposium on photomask and next-generation lithographic mask technologies.
The development represents a new step in Multibeam’s growth plan. It comes after the company’s multicolumn E-Beam Lithography production system was launched and the first shipment was made to SkyWater Technology, a leading foundry.
The move is consistent with the urgent need for faster chip design and manufacturing cycles. The trend is generating interest in Multibeam’s direct-write E-Beam Lithography technology, which has been shown to reduce manufacturing time and operational costs significantly.
Demand is particularly strong in the advanced packaging space, where the system can be leveraged to allow a scalable path beyond Moore’s Law, overcome conventional mask reticle restrictions, and push considerably higher chip-to-chip performance levels than previously possible.
Furthermore, the power, photonics, and MEMs industries are increasingly interested in the system’s substantial depth of focus capability, which enables faster, flawless patterning over warped wafers and high-topography surfaces.
The Multibeam platform revolutionizes EBL by providing new productivity benefits while also enabling high resolution, fine details, a wide field of vision, and a deep depth of focus. The unique architecture, which combines many small columns that function independently and in tandem, is the primary productivity engine, with an advanced control system directing the beams to achieve maximum precision, quality, and speed.
The MB platform is the most productive high-resolution maskless lithography technology on the market, with a throughput more than 100 times that of traditional EBL systems.
Using Synopsys EDA included in the systems, a mix and match dynamic can be used, in which some layers are printed using masks and others are patterned with Multibeam. It provides manufacturing leaders with a game-changing solution for the quick development of new integrated circuit designs, shorter time to market, and faster IC innovation.
Leadership Comments
“A dedicated sales presence in Japan will help us better serve our local customers while giving us a strong position in this thriving IC innovation ecosystem,” said Dr. David K. Lam, Multibeam CEO. “It’s an essential part of our strategy to harness the surging interest in our technology’s unique enabling capabilities from semiconductor companies in the US and international markets. We’re excited to take this significant step.”
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