China to Make 5nm Chips With ‘Outdated’ SAQP

Chinese Company to enhance the density and performance of chips, potentially enabling the mass production of 5nm chips.

According to the South China Morning Post, Naura Technology Group, a company listed in Shenzhen, has recently initiated a study on lithography systems utilizing self-aligned quadruple patterning (SAQP).

This technique aims to enhance the density and performance of chips, potentially enabling the mass production of 5nm chips.

This multiple-patterning process is set to set a new benchmark earmarking the easy availability of 5nm chips.

The SAQP technology development decision by the company was finalized in December, as per the SCMP report, which referenced individuals familiar with the situation.

Following Bloomberg’s report on March 22, it was revealed that SiCarrier, a Shenzhen-based SOE collaborating with Huawei, was granted a patent related to SAQP in late 2023.

Bloomberg mentioned that SiCarrier applied for patents for this technology in September 2021, with Naura also participating in the project.

Certain technology experts believe that although SAQP technology is considered outdated and low-tech, it could still assist Huawei and Semiconductor Manufacturing International Corp (SMIC) in achieving their objective of producing 5nm chips without ASML’s EUV lithography machines.

However, others argue that there is still a considerable distance to cover before achieving success in mass-scaling 5nm chips.

Ever since the technology conflict between China and the United States erupted in 2019, the Dutch government has been urged by Washington to cease the export of EUV lithography to China.

The United States holds influence in this matter due to its ownership of crucial patents for the production of EUV systems.

Starting from January 1 of this year, the Dutch government has halted the issuance of licenses for the transportation of ASML’s cutting-edge deep-ultraviolet (DUV) immersion lithography systems (NXT: 2000i, NXT:2050i, NXT:2100i, and subsequent systems) to China.

Furthermore, ASML is prohibited from selling fully developed DUV lithography systems like NXT:1970 and NXT:1980 to certain Chinese customers who are subject to sanctions, as stated in the Dutch company’s 2023 annual report.

Among the sanctioned firms are Huawei and SMIC, although they still have the option to acquire DUV lithography systems from secondary markets.

For an analogy one can imagine that a person plants two new trees next to each existing tree in an area and then removes all the old ones. The density of trees in the area is doubled.

“Theoretically, it needs six rounds of exposure to make 5nm chips with an existing DUV lithography system in China,” Alex Tsai, a former legislator in Taiwan and a PhD degree holder at Tsinghua University, said in an interview with BNE TV, a pro-Beijing Chinese TV channel in New Zealand. “But the higher the number of exposures, the lower the yield of production.”